貝斯科技股份有限公司

specification:

1.6” Wafer stainless vacuum chuck(hot chuck)
2.Vacuum on-off switch to control each vacuum ring
3.Chuck X-Y stage distance 6”x6”
4.Chuck theta rotation 0°～360° manual
5.Platen up-down 20mm
6.Platen quick up-down
7.Fast pull-out Y stage for easy loading/unloading sample
8.Microscope mount x-y travel 2”x2”
9.Box底座(660mm長x570mm寬x80mm高)
10.Heavy and stable bench base
11.顯微鏡頃仰裝置,角度30度,並帶自動鎖死功能